User contributions for Guiding light

9 June 2024

• 05:5305:53, 9 June 2024 diff hist −35‎ Extreme ultraviolet lithography ‎ completed cleanup
• 05:5105:51, 9 June 2024 diff hist −26‎ Extreme ultraviolet lithography ‎ →‎EUV stochastic issues
• 05:4905:49, 9 June 2024 diff hist −1,265‎ Extreme ultraviolet lithography ‎ →‎EUV photoresist exposure: the role of electrons
• 05:4605:46, 9 June 2024 diff hist −109‎ Extreme ultraviolet lithography ‎ →‎EUV stochastic issues
• 05:4505:45, 9 June 2024 diff hist −113‎ Extreme ultraviolet lithography ‎ →‎EUV stochastic issues
• 05:4305:43, 9 June 2024 diff hist −210‎ Extreme ultraviolet lithography ‎ →‎Use with multiple-patterning
• 04:5504:55, 9 June 2024 diff hist −14,246‎ Extreme ultraviolet lithography ‎ cleanup started

17 April 2024

• 00:5200:52, 17 April 2024 diff hist −239‎ Multiple patterning ‎ →‎Multipatterning productivity improvements

22 March 2024

• 01:0801:08, 22 March 2024 diff hist 0‎ Extreme ultraviolet lithography ‎ →‎EUV-induced plasma
• 01:0701:07, 22 March 2024 diff hist +68‎ Extreme ultraviolet lithography ‎ →‎EUV-induced plasma

21 March 2024

• 14:5414:54, 21 March 2024 diff hist +175‎ m Extreme ultraviolet lithography ‎ →‎EUV-induced plasma: figure
• 14:4214:42, 21 March 2024 diff hist +355‎ Extreme ultraviolet lithography ‎ →‎EUV-induced plasma
• 14:3614:36, 21 March 2024 diff hist −530‎ m Extreme ultraviolet lithography ‎ →‎Impact of photoelectron and secondary electron travel on resolution: cleanup

18 March 2024

• 04:3204:32, 18 March 2024 diff hist +215‎ Extreme ultraviolet lithography ‎ →‎EUV stochastic issues

7 January 2024

• 04:4404:44, 7 January 2024 diff hist +726‎ Extreme ultraviolet lithography ‎ →‎EUV-induced Plasma
• 04:3604:36, 7 January 2024 diff hist +166‎ Extreme ultraviolet lithography ‎ EUV-induced plasma section

10 December 2023

• 08:5408:54, 10 December 2023 diff hist 0‎ Multiple patterning ‎ →‎Pitch splitting
• 08:5308:53, 10 December 2023 diff hist +145‎ Multiple patterning ‎ →‎Pitch splitting
• 08:4608:46, 10 December 2023 diff hist +425‎ Multiple patterning ‎ →‎Pitch splitting: stitching

30 September 2023

• 14:0314:03, 30 September 2023 diff hist +178‎ Multiple patterning ‎ →‎Industrial adoption
• 14:0014:00, 30 September 2023 diff hist −5‎ Multiple patterning ‎ →‎7nm and 5nm FinFETs
• 13:5913:59, 30 September 2023 diff hist +150‎ Multiple patterning ‎ →‎Industrial adoption: 3nm
• 13:5513:55, 30 September 2023 diff hist −376‎ Multiple patterning ‎ →‎Mixed patterning methods
• 13:5413:54, 30 September 2023 diff hist −664‎ Multiple patterning ‎ →‎Mixed patterning methods: Figure cleanup

17 August 2023

• 14:0714:07, 17 August 2023 diff hist −1‎ Extreme ultraviolet lithography ‎ →‎Effect of underlying layers
• 14:0214:02, 17 August 2023 diff hist 0‎ m Extreme ultraviolet lithography ‎ →‎Secondary electron blur vs. dose
• 14:0214:02, 17 August 2023 diff hist 0‎ m Extreme ultraviolet lithography ‎ →‎Secondary electron blur vs. dose
• 14:0114:01, 17 August 2023 diff hist +1‎ m Extreme ultraviolet lithography ‎ →‎Effect of underlying layers: picture location
• 14:0014:00, 17 August 2023 diff hist +504‎ Extreme ultraviolet lithography ‎ →‎EUV photoresist exposure: the role of electrons

24 June 2023

• 15:0615:06, 24 June 2023 diff hist +211‎ Extreme ultraviolet lithography ‎ →‎EUV stochastic issues

7 May 2023

• 15:3215:32, 7 May 2023 diff hist −4‎ Extreme ultraviolet lithography ‎ →‎EUV stochastic issues
• 15:3115:31, 7 May 2023 diff hist +114‎ Extreme ultraviolet lithography ‎ →‎EUV stochastic issues

18 April 2023

• 04:2004:20, 18 April 2023 diff hist 0‎ m Extreme ultraviolet lithography ‎ →‎Single-patterning extension: anamorphic high-NA Tag: Manual revert
• 04:1804:18, 18 April 2023 diff hist 0‎ m Extreme ultraviolet lithography ‎ →‎Single-patterning extension: anamorphic high-NA Tag: Reverted
• 03:5603:56, 18 April 2023 diff hist +321‎ Extreme ultraviolet lithography ‎ →‎Single-patterning extension: anamorphic high-NA

10 April 2023

• 01:2401:24, 10 April 2023 diff hist +173‎ Multiple patterning ‎ →‎Different parts of layout requiring different illuminations

9 April 2023

• 21:3821:38, 9 April 2023 diff hist +217‎ Multiple patterning ‎ →‎Different parts of layout requiring different illuminations

29 March 2023

• 07:0407:04, 29 March 2023 diff hist +173‎ Extreme ultraviolet lithography ‎ →‎Phase shift masks

16 February 2023

• 16:1916:19, 16 February 2023 diff hist +38‎ Extreme ultraviolet lithography ‎ →‎Reduction of pupil fill
• 10:2710:27, 16 February 2023 diff hist +12‎ Extreme ultraviolet lithography ‎ →‎Reduction of pupil fill
• 06:5106:51, 16 February 2023 diff hist +6‎ m Extreme ultraviolet lithography ‎ →‎Reduction of pupil fill
• 06:2206:22, 16 February 2023 diff hist +75‎ Extreme ultraviolet lithography ‎ →‎Reduction of pupil fill
• 06:2106:21, 16 February 2023 diff hist +64‎ Extreme ultraviolet lithography ‎ →‎Reduction of pupil fill
• 05:4205:42, 16 February 2023 diff hist +17‎ Extreme ultraviolet lithography ‎ →‎Reduction of pupil fill
• 05:4105:41, 16 February 2023 diff hist +72‎ Extreme ultraviolet lithography ‎ →‎Reduction of pupil fill

27 January 2023

• 12:1812:18, 27 January 2023 diff hist 0‎ m Extreme ultraviolet lithography ‎ →‎Pattern shift from defocus (non-telecentricity)
• 12:1712:17, 27 January 2023 diff hist +99‎ Extreme ultraviolet lithography ‎ →‎Pattern shift from defocus (non-telecentricity)
• 12:0412:04, 27 January 2023 diff hist +273‎ Extreme ultraviolet lithography ‎ →‎Pattern shift from defocus (non-telecentricity)

21 January 2023

• 13:2213:22, 21 January 2023 diff hist +4‎ Extreme ultraviolet lithography ‎ →‎Pattern shift from defocus (non-telecentricity)
• 13:2113:21, 21 January 2023 diff hist −18‎ Extreme ultraviolet lithography ‎ →‎Pattern shift from defocus (non-telecentricity): updated image