Talk:Chemical vapor deposition

Wiki Education Foundation-supported course assignment

This article is or was the subject of a Wiki Education Foundation-supported course assignment. Further details are available on the course page. Student editor(s): Aaronujl.

Above undated message substituted from Template:Dashboard.wikiedu.org assignment by PrimeBOT (talk) 17:18, 16 January 2022 (UTC)

Untitled

The "Types of chemical vapor deposition" seem to have come from here. Is it copyrighted? Or were the definitions taken from this page and put on that page? 212.108.17.165 09:06, 2 October 2006 (UTC)

It appears the reverse is true - i.e. Yield Engineering Systems lifted their glossary from Wikipedia, as the entry on AACVD, which I wrote myself, now appears on their website. I assume the same is true for the other entries. 128.40.76.138 10:01, 20 October 2006 (UTC)

Cleanup

Somebody needs to fix the symbols for the chemical elements in the formulas so they are not italicized. This can be done using \mbox{} or \mathrm{} or by throwing out the math markup all together (increasing font size in set-off formulas would be a possibility). Gene Nygaard 22:03, 23 January 2007 (UTC)

What rule requires that chemical names not be italicized? I used this markup for the sake of readability. --Smack (talk) 01:46, 24 January 2007 (UTC)

It is a common and well-know rule that can be found in many places. Curiously, I don't find it in looking in the obvious places in the Wikipedia:Manual of Style and subpages. Nonetheless, it is generally observed, as you look throughout Wikpedia articles.

Here are some places citing the rule:

U.S. Government Printing Office Style Manual

• 11.12 ... Chemical symbols (even in italic matter) and certain other standardized symbols are set in roman.

AIP Style Manual, 4th ed., 1990, American Institute of Physics, p. 20

• (3) Some latin letters, considered abbreviations of words, are properly roman instead of italic—for example, chemical symbols (O, Ne), most multiletter abbreviations (fcc, ESR, exp, sin), and most units of measure (K, Hz).

Instead of this

$SiH_{4}\longrightarrow Si+2H_{2}$

Some possibilities

${\mbox{SiH}}_{4}\rightarrow {\mbox{Si}}+2{\mbox{H}}_{2}$ (I think it should be the normal right arrow)

$\mathrm {SiH} _{4}\rightarrow \mathrm {Si} +2\mathrm {H} _{2}$

SiH₄ → Si + 2H₂

SiH₄ → Si + 2H₂

There are other markups for increasing font size as well

Gene Nygaard 09:35, 24 January 2007 (UTC)

Well, then. I used <math> to minimize the markup required, but I guess I'll have to use <sub> instead. --Smack (talk) 01:37, 25 January 2007 (UTC)

the CVD page has a link to "hot-wire" which has no entry for CVD-related topics. JLaCoss, 20-oct-09 —Preceding unsigned comment added by 128.9.64.133 (talk) 20:02, 20 October 2009 (UTC)

Thanks. Removed. Materialscientist (talk) 10:23, 21 October 2009 (UTC)

Shame. CVD was first used to deposit carbon onto carbon filaments used in electric lamps in the 1890's. Because it deposits onto the hottest bits - the bits where carbon is being lost quickest, the presence of carbon containing gases such as methane improved lifetime of the early lamps - a bit like halogen lamps today. — Preceding unsigned comment added by 86.12.137.82 (talk) 14:40, 25 August 2011 (UTC)

Merge or split?

Several specific kinds of CVD currently have their own articles: ALCVD, MOCVD, and PECVD. I do not mention several kinds of epitaxy, because epitaxy is usually considered separate. The PECVD article is a stub, but the others have significant amounts of content. I just added lots of material to the main CVD article, and my source text still has more material on PECVD, APCVD and LPCVD, including sketches of CVD systems, which I would like to write up. I'm not sure whether I should add this material as one or more sections here, or as a series of new articles. As a corollary, I'm considering merging PECVD into here. Any thoughts? --Smack (talk) 04:16, 24 January 2007 (UTC)

CVD is also starting to be used to apply coatings, such as low-e, to float glass inside the float bath during production. Should we add this information to this article or somehow split them? --Horseatingweeds 19:30, 29 January 2007 (UTC)

We can try to treat it here, and then split it off later if it gets too big or we don't want it anymore. Does the process take place under atmospheric pressure? --Smack (talk) 23:53, 29 January 2007 (UTC)

The float bath part of the float glass production process is pressurized slightly with mostly nitrogen and some hydrogen to prevent oxygen from reacting with the tin, which the glass ‘floats’ on. The CVD equipment, at least the ones I assisted in designing, where simple fitted to the existing system with no change in pressure requirements.

I want to start an article on the float glass production system. I plan on going into the CVD glass coating part, so if no one else gets it started first I guess we could just see where it goes. The more I think about it the more I am thinking it should either exist under my planned ‘float glass process’ article, or have its own article like ALCVD, MOCVD, and PECVD.

--Horseatingweeds 04:37, 30 January 2007 (UTC)

If you're going to start a new article, I'd recommend keeping it there, and adding a link here. On an unrelated note, what's a low-e coating (or, more specifically, what's 'e')? --Smack (talk) 05:30, 30 January 2007 (UTC)

The ‘e’ refers to energy, I have always assumed. The coating deflects radiation, heat energy. In hot climates it is used on the outside of the window to keep the heat out. In cold climate, the opposite to keep the heat in. [1]--Horseatingweeds 06:26, 30 January 2007 (UTC)

Emissivity. -- mattb @ 2007-01-30T06:32Z

Indeed, it stands for emissivity. The phrase is often written Low-$\epsilon$ --128.40.76.138 17:37, 16 May 2007 (UTC)

CVD processes for semiconductor manufacturing

Interesting. According to the current article, polysilicons such as silane can be broken down into silicon and dihydrogen. However, if you go look at the article for silane you will find that it is produced from silicon and hydrochloric acid. So what is the point of using chemical vapor deposition if you already have silicon to begin with? -- kanzure 14:53, 20 July 2007 (UTC)

The silicon starting material can be impure. Depositing silicon from silane gives very pure siliccon. Also, it deposits it on a silicon IC where you want it, rather than staying in a lump when refined from silica. You can also go for forms of selective deposition. — Preceding unsigned comment added by 86.12.137.82 (talk) 14:37, 25 August 2011 (UTC)

CVD with trichlorosilane

The exemplar reaction shown is for monochlorosilane. A slip? — Preceding unsigned comment added by 77.160.101.85 (talk) 14:50, 1 May 2014 (UTC)

3D printing and CVD

Given so much progress made recently in 3D printing, I wonder if any researchers have explored the idea of using 3D printing techniques in the context of CVD. e.g. Is there a way to guide where the deposition occur? If it is possible, one may be able to print a diamond crystal in any chosen 3D shape. Some day one may drink off a goblet made of one single crystal of diamond! Sounds like science fiction?
Kowloonese (talk) 23:15, 27 September 2014 (UTC)